[comp.lsi] Scaling from 3.0um technology to 1.25um technology

ee00crr@unccvax.uncc.edu (Ramesh C.R) (12/13/90)

Hi!!
   I'm looking for some information on Scalable SCMOS Technology!!
  I've a number of projects that have been designed using the MOSIS
 3um technology (MAGIC ver 4.10) and am looking forward to scaling
 them down to 1.25um, since MOSIS has stopped using 3.0um process's.

  My main problem was,
       (1) When I tried scaling my files from 3.0um to 1.25um
using the ":cif ostyle" command and then ":cif"ed it, the resultant
cif file obtained was disproportionately scaled.  (i.e) for ex: No two
contacts are of the same dimension, the ndiffusion contacts were 
rectangular, while the pdiffusion contacts were square.  

Is this usual with scalable processes??? Any, help on overcoming this
would be welcome!!  

      (2)  The DRC checker flashes a host of warnings!!  Is the DRC
  checker suitable only for 3um process?????

I would appreciate any help in this regard. 
Thanks!!
 -Ramesh