pasley@SRI-KL (Christine Pasley) (05/28/86)
CS529 - AI In Design & Manufacturing Instructor: Dr. J. M. Tenenbaum Title: Modeling and Reasoning about Semiconductor Fabrication Speakers: John Mohammed and Michael Klein From: Schlumberger Palo Alto Research and Shiva Multisystems Date: Wednesday, May 28, 1986 Time: 4:00 - 5:30 Place: Terman 556 Abstract for John Mohammed's talk: As part of a larger effort aimed at providing symbolic, computer-aided tools for semiconductor fabrication experts, we have developed qualitative models of the operations performed during semiconductor manufacture. By qualitativiely simulating a sequence of these models we generate a description of how a wafer is affected by the operations. This description encodes the entire history of processing for the wafer and causally relates the attributes that describe the structures on the wafer to the processing operations responsible for creating those structures. These causal relationships can be used to support many reasoning tasks in the semiconductor fabrication domain, including synthesis of new recipes, and diagnosis of failures in operating fabrication lines. Abstract for Michael Klein's talk: Current integrated circuit (IC) process computer-aided design (CAD) tools are most useful in verifying or tuning IC processes in the vicinity of an acceptable solution. However, these highly compute-intensive tools are often used too early and too often in the design cycle. Cameo, an expert CAD system, assists IC process designers in synthesizing photolithography step descriptions before using other CAD tools. Cameo has a modular knowledge base containing knowledge for all levels of the synthesis process, including heuristic knowledge as well as algorithms, formulas, graphs, and tables. It supports the parallel development of numerous design alternatives in an efficient manner and links to existing CAD tools such as IC process simulators. Visitors welcome! -------